<?xml version="1.0" encoding="UTF-8"?>
<!DOCTYPE article PUBLIC "-//NLM//DTD JATS (Z39.96) Journal Publishing DTD v1.3 20210610//EN" "JATS-journalpublishing1-3.dtd">
<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">ntv</journal-id><journal-title-group><journal-title xml:lang="ru">Научно-технический вестник информационных технологий, механики и оптики</journal-title><trans-title-group xml:lang="en"><trans-title>Scientific and Technical Journal of Information Technologies, Mechanics and Optics</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">2226-1494</issn><issn pub-type="epub">2500-0373</issn><publisher><publisher-name>Университет ИТМО</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.17586/2226-1494-2022-22-6-1092-1097</article-id><article-id custom-type="elpub" pub-id-type="custom">ntv-316</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>НОВЫЕ МАТЕРИАЛЫ И НАНОТЕХНОЛОГИИ</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>MATERIAL SCIENCE AND NANOTECHNOLOGIES</subject></subj-group></article-categories><title-group><article-title>Нахождение распределения электронов в сверхрешетках AlGaAs/GaAs с узкими барьерами методом вольт-фарадного профилирования</article-title><trans-title-group xml:lang="en"><trans-title>Determination of the electron distribution in thin barrier AlGaAs/GaAs superlattices by capacitance-voltage profiling</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0002-0349-7134</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Василькова</surname><given-names>Е. И.</given-names></name><name name-style="western" xml:lang="en"><surname>Vasilkova</surname><given-names>E. I.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Василькова Елена Игоревна – инженер</p><p>Санкт-Петербург, 194021</p><p>sc 57433507900</p></bio><bio xml:lang="en"><p>Elena I. Vasilkova – Engineer</p><p>Saint Petersburg, 194021</p><p>sc 57433507900</p></bio><email xlink:type="simple">elenvasilkov@gmail.com</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0001-7186-3768</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Пирогов</surname><given-names>Е. В.</given-names></name><name name-style="western" xml:lang="en"><surname>Pirogov</surname><given-names>E. V.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Пирогов Евгений Викторович – младший научный сотрудник</p><p>Санкт-Петербург, 194021</p><p>sc 24468711600</p></bio><bio xml:lang="en"><p>Evgeny V. Pirogov – Junior Researcher</p><p>Saint Petersburg, 194021</p><p>sc 24468711600</p></bio><email xlink:type="simple">zzzavr@gmail.com</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0001-8629-2064</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Соболев</surname><given-names>М. С.</given-names></name><name name-style="western" xml:lang="en"><surname>Sobolev</surname><given-names>M. S.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Соболев Максим Сергеевич – кандидат физико-математических наук, научный сотрудник, заведующий лабораторией</p><p>Санкт-Петербург, 194021</p><p>sc 57205203666</p></bio><bio xml:lang="en"><p>Maxim S. Sobolev – PhD (Physics &amp; Mathematics), ScientificResearcher, Head of Laboratory</p><p>Saint Petersburg, 194021</p><p>sc 57205203666</p></bio><email xlink:type="simple">sobolevsms@gmail.com</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0002-4894-6503</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Баранов</surname><given-names>А. И.</given-names></name><name name-style="western" xml:lang="en"><surname>Baranov</surname><given-names>A. I.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Баранов Артем Игоревич – кандидат физико-математических наук, младший научный сотрудник</p><p>Санкт-Петербург, 194021</p><p>sc 57195761820</p></bio><bio xml:lang="en"><p>Artem I. Baranov – PhD (Physics &amp; Mathematics), Junior Researcher</p><p>Saint Petersburg, 194021</p><p>sc 57195761820</p></bio><email xlink:type="simple">itiomchik@yandex.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0002-7632-3194</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Гудовских</surname><given-names>А. С.</given-names></name><name name-style="western" xml:lang="en"><surname>Gudovskikh</surname><given-names>A. S.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Гудовских Александр Сергеевич – доктор технических наук, ведущий научный сотрудник; профессор</p><p>Санкт-Петербург, 194021;</p><p>Санкт-Петербург, 197022</p><p>sc 6602958574</p></bio><bio xml:lang="en"><p>Alexander S. Gudovskikh – D. Sc., Leading Researcher; Professor</p><p>Saint Petersburg, 194021;</p><p>Saint Petersburg, 197022</p><p>sc 6602958574</p></bio><email xlink:type="simple">gudovskikh@spbau.ru</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0002-7432-2091</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Буравлев</surname><given-names>А. Д.</given-names></name><name name-style="western" xml:lang="en"><surname>Bouravleuv</surname><given-names>A. D.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Буравлев Алексей Дмитриевич – доктор физико-математических наук, заведующий лабораторией; профессор; ведущий научный сотрудник</p><p>Санкт-Петербург, 197022;</p><p>Санкт-Петербург, 194044;</p><p>Санкт-Петербург, 198095</p><p>sc 6603227351</p></bio><bio xml:lang="en"><p>Alexei D. Bouravleuv – D. Sc. (Physics &amp; Mathematics), Head of Laboratory; Professor; Leading Researcher</p><p>Saint Petersburg, 197022;</p><p>Saint Petersburg, 194044;</p><p>Saint Petersburg, 198095</p></bio><email xlink:type="simple">bour@mail.ioffe.ru</email><xref ref-type="aff" rid="aff-3"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Санкт-Петербургский национальный исследовательский Академический университет им. Ж.И. Алферова РАН</institution><country>Россия</country></aff><aff xml:lang="en"><institution>Alferov Saint Petersburg National Research Academic University of the Russian Academy of Sciences</institution><country>Russian Federation</country></aff></aff-alternatives><aff-alternatives id="aff-2"><aff xml:lang="ru"><institution>Санкт-Петербургский национальный исследовательский Академический университет им. Ж.И. Алферова РАН; Санкт-Петербургский государственный электротехнический университет «ЛЭТИ» имени В.И. Ульянова (Ленина)</institution><country>Россия</country></aff><aff xml:lang="en"><institution>Alferov Saint Petersburg National Research Academic University of the Russian Academy of Sciences; Saint Petersburg Electrotechnical University «LETI»</institution><country>Russian Federation</country></aff></aff-alternatives><aff-alternatives id="aff-3"><aff xml:lang="ru"><institution>Санкт-Петербургский государственный электротехнический университет «ЛЭТИ» имени В.И. Ульянова (Ленина); Университет при МПА ЕврАзЭС; Институт аналитического приборостроения РАН</institution><country>Россия</country></aff><aff xml:lang="en"><institution>Saint Petersburg Electrotechnical University «LETI»; University under the Inter-Parliamentary Assembly of EurAsEC; Institute for Analytical Instrumentation of the Russian Academy of Sciences</institution><country>Russian Federation</country></aff></aff-alternatives><pub-date pub-type="collection"><year>2022</year></pub-date><pub-date pub-type="epub"><day>18</day><month>12</month><year>2024</year></pub-date><volume>22</volume><issue>6</issue><fpage>1092</fpage><lpage>1097</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Василькова Е.И., Пирогов Е.В., Соболев М.С., Баранов А.И., Гудовских А.С., Буравлев А.Д., 2024</copyright-statement><copyright-year>2024</copyright-year><copyright-holder xml:lang="ru">Василькова Е.И., Пирогов Е.В., Соболев М.С., Баранов А.И., Гудовских А.С., Буравлев А.Д.</copyright-holder><copyright-holder xml:lang="en">Vasilkova E.I., Pirogov E.V., Sobolev M.S., Baranov A.I., Gudovskikh A.S., Bouravleuv A.D.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://ntv.elpub.ru/jour/article/view/316">https://ntv.elpub.ru/jour/article/view/316</self-uri><abstract><sec><title>Предмет исследования</title><p>Предмет исследования. Исследовано распределение концентрации электронов в однородно легированных кремнием сверхрешетках AlGaAs/GaAs с толщинами слоев 1,5/10 нм и различным количеством квантовых ям.</p></sec><sec><title>Метод</title><p>Метод. Структуры с одинаковыми параметрами слоев и уровнем легирования, содержащие 3, 5 и 25 периодов, выращены на установке молекулярно-пучковой эпитаксии. Профили концентрации носителей в структурах определены методом вольт-фарадного профилирования экспериментально и с помощью численного моделирования.</p></sec><sec><title>Основные результаты</title><p>Основные результаты. В результате анализа экспериментальных вольт-фарадных характеристик получено, что концентрация носителей заряда растет с увеличением числа квантовых ям от 7,1∙1016 см–3 (для трех ям) до 9,2∙1016 см–3 (для 25-ти ям) при уровне легирования 1017 см–3. На профилях концентрации у части образцов наблюдаются плоские участки насыщения в областях, соответствующих сверхрешетке. Концентрации, полученные из компьютерного моделирования, соответствуют экспериментальным данным с точностью в пределах 10 %. Практическая значимость. Вольт-фарадное профилирование позволило определить профиль концентрации носителей по глубине в сверхрешетках с узкими барьерами. Несмотря на то, что метод дает представление о распределении «кажущейся» концентрации носителей, его можно использовать для оценки характера распределения легирующей примеси в гетероструктурах с сильно связанными квантовыми ямами.</p></sec></abstract><trans-abstract xml:lang="en"><p>Electron density distribution in uniformly doped AlGaAs/GaAs superlattices with respective layer thicknesses 1.5/10 nm and a different number of quantum wells was investigated. Experimental samples containing 3, 5 and 25 periods with the same layer parameters were grown by molecular beam epitaxy. Capacitance-voltage profiling was used to determine the carrier concentration profiles in the structures both numerically and experimentally. During the analysis of experimental capacitance-voltage characteristics it was found that the maximum electron concentration increases with an increase in the number of quantum wells starting from 7,1∙1016 сm–3 for 3 wells up to 9,2∙1016 сm–3 for 25 wells with overall superlattice doping level of 1017 сm–3. In some samples saturation areas are observed on the concentration profiles, that are associated with the region of superlattice. Concentration values, obtained from computer modeling, correspond to the experimental data with an error of less than 10 %. Capacitance-voltage profiling is a suitable technique for determining the carrier concentration profiles in thin barrier superlattices. Despite the fact that the method provides distribution of the «apparent» carrier concentration profile, it can be used to estimate the dopant atoms distribution in the strongly coupled quantum well heterostructures.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>вольт-фарадное профилирование</kwd><kwd>сверхрешетки AlGaAs/GaAs</kwd><kwd>распределение носителей</kwd><kwd>молекулярно-пучковая эпитаксия</kwd></kwd-group><kwd-group xml:lang="en"><kwd>capacitance-voltage profiling</kwd><kwd>AlGaAs/GaAs superlattices</kwd><kwd>molecular beam epitaxy</kwd></kwd-group><funding-group><funding-statement xml:lang="ru">Работа частично поддержана Министерством образования и науки Российской Федерации (FSRM-2020-0008) и Российским фондом фундаментальных исследований (19-29-12053).</funding-statement><funding-statement xml:lang="en">The work was partly supported by the Ministry of Science and Higher Education of the Russian Federation (FSRM-2020-0008) and the Russian Foundation for Basic Research (RFBR) (19-29-12053).</funding-statement></funding-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Del Alamo J.A. Nanometre-scale electronics with III–V compound semiconductors // Nature. 2011. V. 479. N 7373. P. 317–323. https://doi.org/10.1038/nature10677</mixed-citation><mixed-citation xml:lang="en">Del Alamo J.A. Nanometre-scale electronics with III–V compound semiconductors. Nature, 2011, vol. 479, no. 7373, pp. 317–323. https://doi.org/10.1038/nature10677</mixed-citation></citation-alternatives></ref><ref id="cit2"><label>2</label><citation-alternatives><mixed-citation xml:lang="ru">Fox M., Ispasoiu R. Quantum wells, superlattices, and band-gap engineering // Springer Handbook of Electronic and Photonic Materials. Cham: Springer International Publishing, 2017. https://doi.org/10.1007/978-3-319-48933-9_40</mixed-citation><mixed-citation xml:lang="en">Fox M., Ispasoiu R. Quantum wells, superlattices, and band-gap engineering. Springer Handbook of Electronic and Photonic Materials. Cham, Springer International Publishing, 2017. https://doi.org/10.1007/978-3-319-48933-9_40</mixed-citation></citation-alternatives></ref><ref id="cit3"><label>3</label><citation-alternatives><mixed-citation xml:lang="ru">Goray L., Pirogov E., Sobolev M., Ilkiv I., Dashkov A., Nikitina E., Ubyivovk E., Gerchikov L., Ipatov A., Vainer Y., Svechnikov M., Yunin P., Chkhalo N., Bouravlev A. Matched characterization of super-multiperiod superlattices // Journal of Physics D: Applied Physics. 2020. V. 53. N 45. P. 455103. https://doi.org/10.1088/1361-6463/aba4d6</mixed-citation><mixed-citation xml:lang="en">Goray L., Pirogov E., Sobolev M., Ilkiv I., Dashkov A., Nikitina E., Ubyivovk E., Gerchikov L., Ipatov A., Vainer Y., Svechnikov M., Yunin P., Chkhalo N., Bouravlev A. Matched characterization of super-multiperiod superlattices. Journal of Physics D: Applied Physics, 2020, vol. 53, no. 45, pp. 455103. https://doi.org/10.1088/1361-6463/aba4d6</mixed-citation></citation-alternatives></ref><ref id="cit4"><label>4</label><citation-alternatives><mixed-citation xml:lang="ru">Мохов Д.В., Березовская Т.Н., Кузьменков А.Г., Малеев Н.А., Тимошнев С.Н., Устинов В.М. Прецизионная калибровка уровня легирования кремнием эпитаксиальных слоев арсенида галлия // Письма в журнал технической физики. 2017. Т. 43. № 19. С. 87–94. https://doi.org/10.21883/PJTF.2017.19.45086.16931</mixed-citation><mixed-citation xml:lang="en">Mokhov D.V., Berezovskaya T.N., Kuzmenkov A.G., Maleev N.A., Timoshnev S.N., Ustinov V.M. Precision calibration of the silicon doping level in gallium arsenide epitaxial layers. Technical Physics Letters, 2017, vol. 43, no. 10, pp. 909–911. https://doi.org/10.1134/S1063785017100091</mixed-citation></citation-alternatives></ref><ref id="cit5"><label>5</label><citation-alternatives><mixed-citation xml:lang="ru">Schroder D.K. Semiconductor Material and Device Characterization. 3rd ed. Piscataway, Hoboken, NJ: Wiley-IEEE Press, 2015. 800 с.</mixed-citation><mixed-citation xml:lang="en">Schroder D.K. Semiconductor Material and Device Characterization. 3rd ed. Piscataway, Hoboken, NJ, Wiley-IEEE Press, 2015, 800 с.</mixed-citation></citation-alternatives></ref><ref id="cit6"><label>6</label><citation-alternatives><mixed-citation xml:lang="ru">Tschirner B.M., Morier-Genoud F., Martin D., Reinhart F.K. Capacitance-voltage profiling of quantum well structures // Journal of Applied Physics. 1996. V. 79. N 9. P. 7005–7013. https://doi.org/10.1063/1.361466</mixed-citation><mixed-citation xml:lang="en">Tschirner B.M., Morier-Genoud F., Martin D., Reinhart F.K. Capacitance-voltage profiling of quantum well structures. Journal of Applied Physics, 1996, vol. 79, no. 9, pp. 7005–7013. https://doi.org/10.1063/1.361466</mixed-citation></citation-alternatives></ref><ref id="cit7"><label>7</label><citation-alternatives><mixed-citation xml:lang="ru">Bobylev B.A., Kovalevskaja T.E., Marchishin I.V., Ovsyuk V.N. Capacitance-voltage profiling of multiquantum well structures // Solid-State Electronics. 1997. V. 41. N 3. P. 481–486. https://doi.org/10.1016/S0038-1101(96)00186-4</mixed-citation><mixed-citation xml:lang="en">Bobylev B.A., Kovalevskaja T.E., Marchishin I.V., Ovsyuk V.N. Capacitance-voltage profiling of multiquantum well structures. Solid-State Electronics, 1997, vol. 41, no. 3, pp. 481–486. https://doi.org/10.1016/S0038-1101(96)00186-4</mixed-citation></citation-alternatives></ref><ref id="cit8"><label>8</label><citation-alternatives><mixed-citation xml:lang="ru">Chiquito A.J., Pusep Yu.A., Mergulhão S., Galzerani J.C. Carrier confinement in an ultrathin barrier GaAs/AlAs superlattice probed by capacitance-voltage measurements // Physica E: Low-dimensional Systems and Nanostructures. 2002. V. 13. N 1. P. 36–42. https://doi.org/10.1016/S1386-9477(01)00222-3</mixed-citation><mixed-citation xml:lang="en">Chiquito A.J., Pusep Yu.A., Mergulhão S., Galzerani J.C. Carrier confinement in an ultrathin barrier GaAs/AlAs superlattice probed by capacitance-voltage measurements. Physica E: Low-dimensional Systems and Nanostructures, 2002, vol. 13, no. 1, pp. 36–42. https://doi.org/10.1016/S1386-9477(01)00222-3</mixed-citation></citation-alternatives></ref><ref id="cit9"><label>9</label><citation-alternatives><mixed-citation xml:lang="ru">Герчиков Л.Г., Дашков А.С., Горай Л.И., Буравлёв А.Д. Разработка дизайна сверхмногопериодных излучающих структур терагерцевого диапазона, выращиваемых методом молекулярно-пучковой эпитаксии // Журнал экспериментальной и теоретической физики. 2021. Т. 160. № 2. С. 197–205. https://doi.org/10.31857/S0044451021080058</mixed-citation><mixed-citation xml:lang="en">Gerchikov L.G., Dashkov A.S., Goray L.I., Bouravleuv A.D. Development of the design of super-multiperiod structures grown by molecular-beam epitaxy and emitting in the terahertz range. Journal of Experimental and Theoretical Physics, 2021, vol. 133, no. 2, pp. 161–168. https://doi.org/10.1134/S1063776121070037</mixed-citation></citation-alternatives></ref><ref id="cit10"><label>10</label><citation-alternatives><mixed-citation xml:lang="ru">Varache R., Leendertz C., Gueunier-Farret M.E., Haschke J., Muñoz D., Korte L. Investigation of selective junctions using a newly developed tunnel current model for solar cell applications // Solar Energy Materials and Solar Cells. 2015. V. 141. P. 14–23. https://doi.org/10.1016/j.solmat.2015.05.014</mixed-citation><mixed-citation xml:lang="en">Varache R., Leendertz C., Gueunier-Farret M.E., Haschke J., Muñoz D., Korte L. Investigation of selective junctions using a newly developed tunnel current model for solar cell applications. Solar Energy Materials and Solar Cells, 2015, vol. 141, pp. 14–23. https://doi.org/10.1016/j.solmat.2015.05.014</mixed-citation></citation-alternatives></ref></ref-list><fn-group><fn fn-type="conflict"><p>The authors declare that there are no conflicts of interest present.</p></fn></fn-group></back></article>
